Relief structures in the self-developing photopolymer materials
Abstract:Surface-relief structures are optically induced by visible laser exposure in the self-developing photopolymers. We describe the processes caused a relief formation, fabricating technologies, analyze the influence of recording process parameters (recording intensity, grating period, the value of adhesion between polymer film and substrate) and present the diffusive-polymerization theory to modeling a surface relief formation in photopolymers. With a holographic method the fan-out element that generates 18 and 25 beams of almost equal intensity is experimentally realized.
Document Type: Original Article
Affiliations: Institute of Physics of the Ukrainian Academy of Science, Pr. Nauky, 46, 03028 Kiev, Ukraine
Publication date: 2002-06-01