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Relief structures in the self-developing photopolymer materials

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Abstract:

Surface-relief structures are optically induced by visible laser exposure in the self-developing photopolymers. We describe the processes caused a relief formation, fabricating technologies, analyze the influence of recording process parameters (recording intensity, grating period, the value of adhesion between polymer film and substrate) and present the diffusive-polymerization theory to modeling a surface relief formation in photopolymers. With a holographic method the fan-out element that generates 18 and 25 beams of almost equal intensity is experimentally realized.

Keywords: Self-developing photopolymers; relief gratings; the diffusive-polymerization theory

Document Type: Original Article

DOI: https://doi.org/10.1078/003040202400391444

Affiliations: Institute of Physics of the Ukrainian Academy of Science, Pr. Nauky, 46, 03028 Kiev, Ukraine

Publication date: 2002-06-01

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