Skip to main content

Optimization design of immersion magnetic lenses in projection electron beam lithography

The full text article is temporarily unavailable.

We apologise for the inconvenience. Please try again later.

Abstract: In this paper, a novel immersion magnetic lens used for projection electron beam lithography is optimized by Powell method. The optimized structure of an immersion magnetic lens can be reached with a criterion of minimum objective parameter, which is the value of curvilinear axial astigmatism in the present paper. The results show that axial astigmatism is decreased from 243 nanometer to 50 nanometer after optimization. It can be seen that the Powell method is suitable for the optimization design of immersion magnetic lenses.
No References
No Citations
No Supplementary Data
No Article Media
No Metrics

Keywords: Immersion magnetic lens; Powell method; axial astigmatism

Document Type: Original Article

Affiliations: Department of Electronics Science and Technology, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an, 710049, P. R. China

Publication date: 01 April 2001

  • Access Key
  • Free content
  • Partial Free content
  • New content
  • Open access content
  • Partial Open access content
  • Subscribed content
  • Partial Subscribed content
  • Free trial content
Cookie Policy
Cookie Policy
Ingenta Connect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more