Skip to main content

A spatial rule adaptation procedure for reliable production control in a wafer fabrication system

Buy Article:

$63.00 plus tax (Refund Policy)


In conventional approaches to scheduling problems, a single dispatching rule was applied to the all machines in a manufacturing system. However, since the condition of a machine generally differs from those of other machines in the context of overall system operation, it is reasonable to identify a suitable dispatching rule for each machine. This study proposes an adaptive procedure which produces a reliable dispatching rule for each machine. The dispatching rule consists of several criteria of which weights are adaptively determined by learning through repeated runs of simulation. A Taguchi experimental design for the simulation is used to find effective criteria weights with efficiency and robustness. For evaluation, the proposed method was applied to a scheduling problem in a semiconductor wafer fabrication system. The method resulted in reliable performances compared with those of traditional dispatching rules.

Document Type: Research Article


Publication date: 1998-06-01

More about this publication?
  • Access Key
  • Free ContentFree content
  • Partial Free ContentPartial Free content
  • New ContentNew content
  • Open Access ContentOpen access content
  • Partial Open Access ContentPartial Open access content
  • Subscribed ContentSubscribed content
  • Partial Subscribed ContentPartial Subscribed content
  • Free Trial ContentFree trial content
Cookie Policy
Cookie Policy
Ingenta Connect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more