Projection lithography by means of parametric photon pairs

Author: Fukutake, Naoki¹

Source: Journal of Modern Optics, Volume 53, Numbers 5-6, March-April 2006 , pp. 719-728(10)

Publisher: Taylor and Francis Ltd

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Abstract:

It is well known that entangled-photon pairs generated by spontaneous parametric down-conversion exhibit a property that is analogous to that of ordinary incoherent lights. We formulate an image-forming optical theory of quantum lithography that comprehends the both conceptions of partial coherence and partial entanglement by extending a classical image-forming optical theory. Our optical system consists of an image-forming system, an illumination system with a second-order nonlinear medium, and two-photon absorbing materials. We evaluate the resolution of the quantum lithography system by using the optical transfer function and show a special case to be a super-resolving system.

Document Type: Research article

DOI: 10.1080/09500340500443128

Affiliations: 1: Core Technology Center, Nikon Corporation, 201-9, Miizugahara, Kumagaya, Saitama 360-8559, Japan

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