Recent progress in quantum and nonlinear optical lithography

Authors: Boyd, Robert W.1; Bentley, Sean J.2

Source: Journal of Modern Optics, Volume 53, Numbers 5-6, March-April 2006 , pp. 713-718(6)

Publisher: Taylor and Francis Ltd

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Abstract:

We review the status of the field of quantum lithography, that is, the use of quantum-mechanical effects to write lithographic features with resolution finer than that achievable according to the Rayleigh criterion. In particular, we first review the original quantum lithography proposal by Boto et al ., and we then describe the status of research aimed at realizing this process.

Document Type: Research article

DOI: 10.1080/09500340500283722

Affiliations: 1: Institute of Optics and Department of Physics and Astronomy, University of Rochester, Rochester, New York 114627, USA 2: Department of Physics, Adelphi University, Garden City, New York 11530, USA

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