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TiAlN coatings synthesised using a dense plasma focus system and varied focus shots

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TiAlN coatings were synthesised by a 2.3 kJ pulsed plasma focus system. The effect of focus shots on crystallography, microstructure, surface morphology, roughness and hardness was investigated. The coating's crystallography and microstructure were investigated using X-ray diffraction (XRD) characterisation. The XRD data showed that TiAlN coatings were crystallised in the cubic NaCl B1 structure with orientations in the (111), (200), (220) and (311) crystallographic planes. Texture coefficients showed a competition between (111) and (200) planes. The coatings surface morphology and thickness analyses were carried out using scanning electron microscopy (SEM). SEM micrographs showed dense and uniformly spread film with fine-grained morphology with hardly any pit, hole and crater. The surface roughness and hardness of TiAlN coatings were investigated by atomic force microscopy and Vickers microhardness tester. Grain size and roughness were found to decrease, whereas thickness and hardness were found to increase, with increasing focus shots.

Keywords: AFM; SEM; X-ray diffraction; plasma focus system; titanium aluminium nitride

Document Type: Research Article

Affiliations: Department of Physics,Government College University, 54000Lahore, Pakistan

Publication date: 01 November 2011

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