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Volume 59, Number 1, Volume 59/2003

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Guest Editorial
pp. vii
Authors: Joshi, Vikram; Agrawal, Sanjeev; Ramesh, R.

Chemical Vapor Deposition of Ru Bottom Electrode for Ferroelectric Bi4 − xLaxTi3O12 Capacitors
pp. 1437-1443(7)
Authors: Furukawa, Taisuke; Kuroiwa, Takeharu; Fujisaki, Yoshihisa; Sato, Takehiko; Ishiwara, Hiroshi

Preparation of PZT Thin Films by Liquid-Source MOCVD Using of Cyclohexane Solvent
pp. 1445-1451(7)
Authors: Nishioka, Yutaka; Masuda, Takeshi; Kajinuma, Masahiko; Yamada, Takakazu; Uematsu, Masaki; Suu, Koukou

Development of Low Temperature Al2O3 MOCVD for Ferroelectric Film Passivation on 8″ Wafers
pp. 1453-1463(11)
Authors: Rice, C. E.; Cuchiaro, J. D.; Sun, S.; Provost, L. G.; Tompa, G. S.; Davenport, T.; Fox, G.; Sun, S.; Chu, F.

Low Temperature PZT Film by MOCVD
pp. 1465-1473(9)
Authors: Rice, C. E.; Cuchiaro, J. D.; Sun, S.; Provost, L. G.; Tompa, G. S.; Beratan, Howard; Hanson, Charles; Tanner, Hilary

Influence of Post-Annealing on the Characteristics of Pb(Zr,Ti)O3 Thin Films Deposited by Liquid Delivery MOCVD Using a Cocktail Solution
pp. 1475-1482(8)
Authors: Otani, Yohei; Abe, Norikazu; Okamura, Soichiro; Shiosaki, Tadashi

Atomic Layer Deposition (ALD) of Bismuth Titanium Oxide Thin Films Using Direct Liquid Injection (DLI) Method
pp. 1483-1489(7)
Authors: Cho, Young Jin; Min, Yo-Sep; Lee, Jung-Hyun; Seo, Bum-Seok; Lee, June Key; Park, Young Soo; Choi, Jin-Hak

Fast and Superfast Motion of Ferroelectric Domain Boundaries
pp. 1493-1503(11)
Authors: Shur, Vladimir Ya.; Rumyantsev, Evgenii L.; Nikolaeva, Ekaterina V.; Shishkin, Eugene I.

Ferroelectric Lead Zirconate Titanate and Barium Titanate Nanotubes
pp. 1513-1520(8)
Authors: Luo, Y.; Szafraniak, I.; Nagarajan, V.; Wehrspohn, R. B.; Steinhart, M.; Wendorff, J. H.; Zakharov, N. D.; Ramesh, R.; Alexe, M.

Fabrication of Isolated Ferroelectric Domains in Nano-Scale
pp. 1521-1527(7)
Authors: Jung, Won-Ku; Choi, Young-Soo; Bae, Changdeuck; Lee, Bong-Ki; Kim, Seung-Hyun; Shin, Hyunjung

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