High-κ Dielectric Materials for Microelectronics

Authors: Wallace, Robert M.¹; Wilk, Glen D.²

Source: Critical Reviews in Solid State and Material Sciences, Volume 28, Number 4, October-December 2003 , pp. 231-285(55)

Publisher: Taylor and Francis Ltd

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Abstract:

This article reviews the current status of high-κ dielectric materials for microelectronics. In particular, recent work impacting the integration of these high-κ materials for gate dielectric and capacitor applications in advanced scaled microelectronic devices is reviewed.

Keywords: high-κ; dielectric; gate stack; capacitor; scaled microelectronics

Document Type: Research article

DOI: http://dx.doi.org/10.1080/714037708

Affiliations: 1: Departments of Electrical Engineering and Physics, P.O. Box 830688, EC33, University of Texas at Dallas, Richardson, Texas 75083 2: ASM America, 3440 E. University Drive, Phoenix, Arizona 85034

Publication date: 2003-10-01