Reactive Phase Formation in Thin Film Metal/Metal and Metal/Silicon Diffusion Couples

Authors: Tomi Laurila1¹; Jyrki Molarius²

Source: Critical Reviews in Solid State and Material Sciences, Volume 28, Number 3, July-September 2003 , pp. 185-230(46)

Publisher: Taylor and Francis Ltd

Document Type: Research article

DOI: http://dx.doi.org/10.1080/10408430390261955

Affiliations: 1: Lab. of Electronics Production Technology, Helsinki University of Technology, P.O. Box 3000, FIN-02015 HUT, Finland 2: VTT Microelectronics, P.O. Box 1101, FIN-02044 VTT, Finland

Publication date: 2003-07-01

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