Authors: Dimitrov, Vasili; Gorker, Lev

Source: Progress in Reaction Kinetics and Mechanism, Volume 31, Number 1, 2006 , pp. 45-58(14)

Publisher: Science Reviews 2000 Ltd

Abstract:

Electrochemical reduction of a metal can proceed both in the presence and absence of an external current source, in the latter case the electrode potential being oscillated (e.g., electroless copper deposition). A valid model for these oscillations has been unavailable up to date.

Using self-catalyzed electroless copper deposition as an experimental basis, it is shown that the model of the Dynamic Electrical Double Layer (DEDL) allows for calculation of steady oscillations by a modified differential Nernst equation on the assumption that the process on the whole is either one of quasi-equilibrium or weakly non-equilibrium and that the current values of electrode potential conform to the current electrolyte composition, the experimental conditions being given.

This enhances the applicability of the main electrochemical law for the description of self-catalyzed electrochemical plating.

Keywords: Dynamic Electrical Double Layer (DEDL); electroless; Nernst potential; copper plating

Document Type: Research article

DOI: http://dx.doi.org/10.3184/007967406779133957

Affiliations: 1: Raicol Crystal Ltd., 15 Geron Street, Industrial Zone, Yehud, 56217, Israel

Publication date: 2006-01-01

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• Progress in Reaction Kinetics & Mechanism is an international journal for the quarterly publication of both in-depth reviews and research articles.

  In-depth reviews are comprehensive accounts bringing together work from many sources with the aim of providing an article of lasting value that will become established as the reference source in the particular subject. Research articles, on the other hand, normally focus on a relatively new or recently developed field or technique giving a state-of-the-art account of the subject and may well refer to a narrower range of existing work. It covers the fields of kinetics and mechanisms of chemical processes in the gas phase and solution of both simple and complex systems.

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