A Direct Measurement of Wave Resistance by the Measurement of Wave Height on a Surface Patch
Authors: Çalışal, Sander M.; Şireli, Mete E.; Tan, Jeff
Source: Journal of Ship Research, Volume 53, Number 3, September 2009 , pp. 170-177(8)
Publisher: Society of Naval Architects and Marine Engineers (SNAME)
Abstract:
This paper explains a new procedure for the direct measurement of wave resistance from the measurement of ship-wave height on a patch of surface water near the hull. The optical instrumentation used and the newly developed method for numerical calculations are explained. Internal consistency tests and a comparison with well-known longitudinal wave height cut methods, LCM, are provided. This numerical procedure does not require any truncation correction and uses all of the data collected by an optical system described in the paper. This procedure could be more attractive to narrower tanks, as the requirement for tank beam to model length ratio for successful truncation correction b/L > 5 is removed. This formulation can also be used in connection with data collected by a series of wave probe records.Keywords: WAVES; RESISTANCE (GENERAL); HULL FORM; HYDRODYNAMICS (GENERAL); MODEL TESTING; POWERING ESTIMATION
Document Type: Research article
Publication date: 2009-09-01
- The Journal of Ship Research is a quarterly publication providing highly technical papers on applied research in hydrodynamics, propulsion, ship motions, structures, and vibrations. While the Journal requires that papers present the results of research that advances ship and ocean science and engineering, most contributions bear directly on other disciplines, such as civil and mechanical engineering, applied mathematics, and numerical analysis. High quality papers are contributed from the U.S., Canada and overseas, with representation from established authorities as well as new researchers.
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- In this Subject: General & Civil Engineering , Hydraulic & Environmental Engineering , Mechanical Engineering
- By this author: Çalışal, Sander M. ; Şireli, Mete E. ; Tan, Jeff

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