Effects of Metallic, Semiconducting, and Insulating Substrates on the Coupling Involving Radiative Polaritons in Thin Oxide Films

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Abstract:

Through simulations, this work explores the effects of conducting, semiconducting, and insulating substrates on the absorption of infrared radiation by radiative polaritons in oxide layers with thicknesses that range from 30 nm to 9 μm. Using atomic layer deposition, oxide layers can be formed in the nanometer scale. Our results suggest that the chemistry and conductivity of the substrate determine the amount of absorption by radiative polaritons in oxide layers thinner than the skin depth. The effects of the chemistry and conductivity of the substrate are especially effective for oxide films thinner than about 250 nm, which we label as the substrate sensitive thickness of the oxide film.

Keywords: Atomic layer deposition; Infrared spectroscopy; Radiative polaritons; Thin oxide films

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/11-06489

Affiliations: 1: Department of Physics and Astronomy, James Madison University, Harrisonburg, Virginia 22807, USA 2: Department of Chemistry and Biochemistry, James Madison University, Harrisonburg, Virginia 22807, USA 3: Department of Mechanical Engineering, Howard University, Washington, D.C. 20059, USA 4: Department of Mechanical Engineering, University of Utah, Salt Lake City, Utah 84112, USA

Publication date: February 1, 2012

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