Detection of Copper in Water Using On-Line Plasma-Excited Atomic Absorption Spectroscopy (AAS)

$29.00 plus tax (Refund Policy)

Buy Article:

Abstract:

A measurement method and apparatus was developed to measure continuously toxic metal compounds in industrial water samples. The method was demonstrated by using copper as a sample metal. Water was injected into the sample line and subsequently into a nitrogen plasma jet, in which the samples comprising the metal compound dissolved in water were decomposed. The transmitted monochromatic light was detected and the absorbance caused by copper atoms was measured. The absorbance and metal concentration were used to calculate sensitivity and detection limits for the studied metal. The sensitivity, limit of detection, and quantification for copper were 0.45 ± 0.02, 0.25 ± 0.01, and 0.85 ± 0.04 ppm, respectively.

Keywords: AAS; ATOMIC ABSORPTION SPECTROSCOPY; DIRECT-CURRENT PLASMA; ON-LINE HEAVY METAL CONCENTRATION MEASUREMENT

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/10-06051

Affiliations: 1: University of Oulu, Measurement and Sensor Laboratory, Technology Park 127, FIN-87400 Kajaani, Finland 2: Measurepolis Development Oy, Kehräämöntie 7, P.O. Box 103, FIN-87400 Kajaani, Finland; Centre for Measurement and Information Systems, P.O. Box 52, FIN-87101 Kajaani, Finland. risto.oikari@cemis.fi

Publication date: June 1, 2011

More about this publication?
Related content

Tools

Favourites

Share Content

Access Key

Free Content
Free content
New Content
New content
Open Access Content
Open access content
Subscribed Content
Subscribed content
Free Trial Content
Free trial content
Cookie Policy
X
Cookie Policy
ingentaconnect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more