Authors: Banyay, M.¹; Juschkin, L.²

Source: Applied Spectroscopy, Volume 64, Issue 4, Pages 94A-112A and 359-465, (April 2010) , pp. 401-408(8)

Publisher: Society for Applied Spectroscopy

Abstract:

In this paper we present a practical approach to the analysis of spectra recorded from a table-top reflectometer operating in the extreme ultraviolet (UV) spectral range. Such in-lab tools, which utilize light from plasma based sources, are currently under investigation for a broad range of applications such as surface and thin-film analysis, near-edge X-ray absorption fine structure (NEXAFS) studies, or reflectivity measurements. In a polychromatic approach one is able to record surface-sensitive reflectometric spectra that are characteristic for each material or thin-film-layer stack. By monitoring the incident and emergent spectrum before and after the sample using two independent detectors, one can deduce its reflectivity. However, the analysis of the raw data, in terms of digitized spectrometric intensity values, can be difficult due to the nature of the quasi-continuous emission from such plasma sources, particularly with xenon, which is a good broad-band radiator in the 10-20 nm spectral range. The complexity of configurations involved in transitions of highly ionized xenon makes a line-by-line analysis very difficult as the real spectrum consists of thousands of unresolved transitions superimposed by distinctive lines. Additionally, sampling issues, detector geometry, and minor setup misalignments can distort the result. We propose a practical algorithm for spectral decomposition and sharpening of such data. Measurement results are presented that confirm the functionality of the algorithm.

Keywords: EXTREME ULTRAVIOLET; EUV; XUV; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE; NEXAFS; ALGORITHMS; SPECTRUM; REFLECTOMETRY; METROLOGY

Document Type: Research article

DOI: http://dx.doi.org/10.1366/000370210791114176

Affiliations: 1: RWTH Aachen University, Chair for Technology of Optical Systems, Steinbachstr. 15, Aachen 52074, Germany, JARA-Fundamentals of Future Information Technology, Research Centre, Jülich 52425, Germany;, Email: matus.banyay@ilt.fraunhofer.de 2: RWTH Aachen University, Chair for Technology of Optical Systems, Steinbachstr. 15, Aachen 52074, Germany, JARA-Fundamentals of Future Information Technology, Research Centre, Jülich 52425, Germany

Publication date: 2010-04-01

More about this publication?

• The Society publishes the internationally recognized, peer reviewed journal, Applied Spectroscopy, which is available both in print and online. Subscriptions are included with membership or can be purchased by institutional or corporate organizations. Abstracts may be viewed free of charge.
  
  Previously published as Bulletin (Society for Applied Spectroscopy)
• Editorial Board
• Information for Authors
• Submit a Paper
• Subscribe to this Title
• Membership Information
• Request copyrighted SAS materials
• Spectroscopic Nomenclature
• Focus Compendium
• ingentaconnect is not responsible for the content or availability of external websites

Related content

• In this: publication
• By this: publisher
• In this Subject: Analytical Chemistry
• By this author: Banyay, M. ;  Juschkin, L.

Website © Publishing Technology. Article copyright remains with the publisher, society or author(s) as specified within the article.

• Terms and conditions
• Privacy policy
• Information for advertisers