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Near-Infrared Spectroscopy for Monitoring Wafer Etchant Solution Using a Teflon Tube

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Keywords: NEAR-INFRARED SPECTROSCOPY; SEMI-CONDUCTOR CLEANING; TEFLON; WAFER ETCHANT

Document Type: Short Communication

DOI: http://dx.doi.org/10.1366/0003702054411724

Affiliations: Department of Chemistry, College of Natural Sciences, Hanyang University, Haengdang-Dong, Seongdong-Gu, Seoul, Korea 133-791

Publication date: July 1, 2005

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