If you are experiencing problems downloading PDF or HTML fulltext, our helpdesk recommend clearing your browser cache and trying again. If you need help in clearing your cache, please click here . Still need help? Email email@example.com
Characterization of nanometer-order organic contaminants on polymer film and silicon wafer surface has been investigated by a modified IR-Johnson method. We have proposed a silver film-enhanced IR-Johnson
method that is useful for surface contaminant analysis. In the present method, organic traces are transferred from the surface of a polymer film or silicon wafer onto the KBr particles deposited with silver
film, and then the KBr particles are analyzed directly by diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS). Infrared absorption of organic traces was enhanced by the presence of silver
island film. With this method, a spectrum of nanometer-order organic traces can be obtained without any interference from the polymer film substrate. The present method is as surface-sensitive as X-ray
photoelectron spectroscopy (XPS) and provides a large amount of information on the chemical structure of surface contaminants. This is a promising method for the surface characterization of polymer films
and silicon wafer.
The Society publishes the internationally recognized, peer reviewed journal, Applied Spectroscopy, which is available both in print and online. Subscriptions are included with membership or can be purchased by institutional or corporate organizations. Abstracts may be viewed free of charge. Previously published as Bulletin (Society for Applied Spectroscopy)