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Cathodic Sputtering under High-Gas-Flow Jets

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Studies of cathodic sputtering with gas flow rates up to 2.13 L/min/jet were carried out in an Atomsource sputtering atomizer with Ar as the jet gas and Cu as the cathode sample. These flow rates are 20-fold greater than those normally used and were found to increase net sputtering yield significantly. A fourfold increase in net sputtering yield was observed when the number of jets in use was decreased from six to one, with the gas flow rate and other conditions held constant. Possible explanations for these effects are offered.

Keywords: Cathodic sputtering; Gas flow; Glow discharge; Jet; Sputtering yield

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/0003702953964903

Affiliations: Department of Chemistry, Gilbert Hall 153, Oregon State University, Corvallis, Oregon 97331-4003

Publication date: July 1, 1995

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