Authors: Ratliff, P.H.¹; Harrison, W.W.²

Source: Applied Spectroscopy, Volume 49, Issue 7, Pages 12A-19A and 863-1062 (July 1995) , pp. 863-871(9)

Publisher: Society for Applied Spectroscopy

Abstract:

The role of water vapor as an impurity in glow discharge mass spectrometry is examined by means of pulsed injection of water into an argon discharge. The effect of water vapor on both analyte and intrinsic gas species is determined. Water dissociates in the discharge to produce reactants that can influence analytical results. The extent of this effect is dependent on the reactivity of the cathode sample with water and its dissociation products. Metal oxides are observed during and shortly after the pulsed water injection. Three different cathode materials (titanium, iron, and copper) are studied, with a range of metal oxide bond strengths. Titanium, which has strong gettering action in the glow discharge plasma, exhibits the shortest perturbation time after addition of water vapor. The experiments show the need to remove trace water from glow discharges for best analytical results.

Keywords: Glow discharge; Sputtering; Mass spectrometry; Water vapor

Document Type: Research article

DOI: http://dx.doi.org/10.1366/0003702953964769

Affiliations: 1: Department of Chemistry, University of Florida, Gainesville, Florida 32611-2046; present address: United Technologies, Pratt & Whitney, 400 Main Street, East Hartford, CT 06108 2: Department of Chemistry, University of Florida, Gainesville, Florida 32611-2046

Publication date: 1995-07-01

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