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Spectroscopic Properties of WO3 Thin Films: Polarized FT-IR/ATR, X-ray Diffraction, and Electronic Absorption

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The Fourier transform infrared/micro-attenuated total reflectance (FTIR/mATR), X-ray diffraction (XRD), and electronic absorption properties of thin tungsten oxide films are characterized. Thin films of tungsten oxide (100-500Å) deposited on SiO2 exhibit a different orientation or structure than thicker films. A p-polarized longitudinal optical (LO) mode at 970 cm-1 occurs in all ATR spectra of WO3 thin films and is one of the strongest IR bands in the spectra. The spectroscopic properties of tungsten oxide films are characterized as a function of substrate and heat treatment.

Keywords: Infrared absorption spectroscopy; Polarized FT-IR/ATR spectroscopy; Tungsten trioxide thin films; X-ray diffraction

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/000370294774368992

Affiliations: 1: Department of Chemistry, University of Maine, Orono, Maine 04469; currently at Tufts University, Department of Chemistry, Medford, MA 02155 2: Department of Chemistry, University of Maine, Orono, Maine 04469

Publication date: June 1, 1994

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