Surface Features of Conductors Eroded by Sputtering in a Magnetron Glow Discharge Plasma

Authors: Dehghan, Khodayar1; Shi, Zhan2; Woodrum, Teresa Holbrook3; Brewer, Stephen4; Sacks, Richard2

Source: Applied Spectroscopy, Volume 48, Issue 5, Pages 12A-19A and 545-646 (May 1994) , pp. 553-560(8)

Publisher: Society for Applied Spectroscopy

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Abstract:

Surface characteristics of four different metals and alloys sputtered in Ar in a plasma generated by a previously described dc planar magnetron are examined. The study of Al alloy, Cu, brass, and Au samples indicates qualitatively that erosion increases with decreasing support gas pressure, increasing discharge currents, and increasing atomic number of the sputtered elements. These observations are supported by quantitative studies of mass loss rates as functions of support gas pressure, discharge current, and sample atomic number. Microscopic examination reveals hillocks formed on sputtered surfaces. With increased mass loss, hillocks tend to overlap. No correlation between inclusions and hillock locations is observed. Silver samples, though relatively (99.9%) pure, behave anomalously, acquiring a Cu coating at low discharge support gas pressures.

Keywords: Glow discharges; Magnetron; Scanning electron microscopy; Sputtering

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/0003702944924808

Affiliations: 1: Department of Chemistry, Eastern Michigan University, Ypsilanti, Michigan 48197; present address: Department of Chemistry, Case Western Reserve University, Cleveland, OH 44106 2: Department of Chemistry, University of Michigan, Ann Arbor, Michigan 48109 3: Department of Chemistry, Eastern Michigan University, Ypsilanti, Michigan 48197; present address: Department of Chemistry, University of Michigan, Ann Arbor, MI 48109 4: Department of Chemistry, Eastern Michigan University, Ypsilanti, Michigan 48197

Publication date: May 1, 1994

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