In Situ Measurements of Infrared Reflection Absorption and Emission Spectra of Oxide Film Formed on Chromium Metal at Temperatures up to 973 K

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An apparatus has been constructed for in situ measurements of infrared reflection absorption and emission spectra. Chromium metal oxidized at 973 K in air for 25 min was investigated at various temperatures up to 973 K. The frequencies of the bands shifted toward the lower wavenumber range with increasing temperature. In situ measurements were made for isothermal oxidation of chromium at 773 K.

Keywords: Chromium oxidation; IR emission spectrum; IR reflection absorption spectrum

Document Type: Research Article


Affiliations: 1: Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 227, Japan 2: Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguroku, Tokyo 152, Japan

Publication date: March 1, 1992

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