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Characterization of a Dual Inductively Coupled Plasma Atomic Emission Source

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Abstract:

A dual inductively copuled plasma atomic emission spectroscopic system is described. This new analytical discharge segregates the normally integrated processes of sampling and spectral excitation associated with atomic emission sources. A low-power, low-argon-flow, radio-frequency plasma is used as a sampling device to create gaseous species from liquid and solid samples which are subsequently transported to a second plasma for excitation. Design and construction of instrumentation and associated operational parameters are reviewed. Comparisons of the sampling and the excitation plasmas include spatial emission profiles, linear calibration plots, signal-to-background ratios, and analytical detection limits. Use of the dual ICP for direct analysis of particulates (coal fly ash and firebrick) is demonstrated.

Keywords: Analytical methods; Emission spectroscopy; ICP; Instrumentation, emission spectroscopy; Spectroscopic techniques

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/0003702874449039

Affiliations: 1: Department of Chemistry, Wayne State University, Detroit, Michigan 48202; current address: BASF Corp., Wyandotte, MI 48192 2: Department of Chemistry, Wayne State University, Detroit, Michigan 48202

Publication date: March 1, 1987

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