An HF-resistant Sample Introduction System for the Inductively Coupled Plasma

Authors: Barnes, Ramon M.1; Mahanti, Himansu S.2

Source: Applied Spectroscopy, Volume 37, Issue 1, Pages 1-87 (January/February 1983) , pp. 17-19(3)

Publisher: Society for Applied Spectroscopy

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Abstract:

A sample introduction system constructed of materials completely resistant to HF was developed for analysis of HF-containing samples. A machined graphite injector tube, polytetrafluoroethylene (PTFE) spray chamber, and cross flow nebulizer containing PTFE capillaries were employed. The arrangement is completely compatible with commercial ICP systems and can be interchanged readily. The nebulizer efficiency and memory effect were studied and compared with a conventional system. Analysis of silicon in commercial HF acid was performed.

Keywords: Determination of Si in HF; Emission spectroscopy; Inductively coupled plasma discharge; Sample introduction

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/0003702834634208

Affiliations: 1: Department of Chemistry, GRC Towers, University of Massachusetts, Amherst, Massachusetts 01003-0035 2: Department of Chemistry, GRC Towers, University of Massachusetts, Amherst, Massachusetts 01003-0035; on leave from National Institute of Foundary and Forge Technology, Hatia, Ranchi, India

Publication date: January 1, 1983

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