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Excitation of C3πu State of N2 in a Radio-frequency Glow Discharge

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Abstract:

Radio-frequency plasmas are now widely used for material processing in the semiconductor industry. Like many technical developments, the empirical process development has preceded a thorough understanding of the physical or chemical processes occurring in these systems. Optical spectroscopy provides an excellent probe of the processes occurring in these glow discharge systems.

Keywords: rf plasmas

Document Type: Short Communication

DOI: http://dx.doi.org/10.1366/0003702814731761

Affiliations: Intel Corporation, Aloha, Oregon 97005 and Bell Laboratories, Allentown, Pennsylvania 18103

Publication date: January 1, 1981

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