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Fluorescence of Optical Materials Stimulated by ArF Laser Radiation at 193 nm

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Abstract:

The fluorescence spectra of four optical materials (S1-UV quartz, UV grade sapphire, MgF2, and BaF2) have been recorded using ArF laser radiation at 193 nm (6.4 eV) as an excitation source. The time-resolved fluorescence intensities have also been measured at several wavelengths using a transient digitizer with 2 ns resolution. All of the materials exhibit a fast fluorescence which follows the exciting laser pulse and has a lifetime τR < 7 ± 2 ns. This fast fluorescence is present as a broad continum from 200 to 1000 nm with maxima in the UV and the IR. In addition, there are fluorescence components with longer lifetimes which are characteristic of the individual materials. The results suggest further opportunities for study of optical materials using ArF lasers and indicate an area of caution to be exercised by experimentalists employing ArF lasers for excitation experiments.

Keywords: ArF laser; Laser-induced fluorescence; Optics; Time-resolved spectroscopy

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/0003702804731096

Affiliations: Department of Chemistry, Kansas State University, Manhattan, Kansas 66506; present address: Atomic Energy of Canada, Whiteshell Nuclear Research Station, Pinawa, Manitoba, Canada R0E 1L0

Publication date: November 1, 1980

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