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A Plasma Torch Configuration for Inductively Coupled Plasma as a Source in Optical Emission Spectroscopy and Atomic Absorption Spectroscopy

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Abstract:

Different studies on inductively coupled argon plasma (ICP) have clearly shown that this source provides very good detection limits, superior to both plasma-jet and microwave plasma. The ICP source offers extended linearity and sensitivity, better than classical atomic absorption spectroscopy (AAS). Nevertheless, this sort of discharge is more expensive than either type of device (mainly due to the high argon consumption rate). Therefore, the geometry of the plasma torch arrangement must be studied very carefully in order to obtain an easy assembly and a low argon flow rate for the best analytical results possible.

Keywords: Atomic absorption spectroscopy; Emission spectroscopy; ICP torch configuration

Document Type: Short Communication

DOI: http://dx.doi.org/10.1366/000370277774463751

Affiliations: Laboratoire de Chimie Industrielle et Analytique, Institut National des Sciences Appliquées, Bat. 401, 20 Avenue A. Einstein, 69621 Villeurbanne Cedex, France

Publication date: May 1, 1977

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