A Plasma Torch Configuration for Inductively Coupled Plasma as a Source in Optical Emission Spectroscopy and Atomic Absorption Spectroscopy
Abstract:Different studies on inductively coupled argon plasma (ICP) have clearly shown that this source provides very good detection limits, superior to both plasma-jet and microwave plasma. The ICP source offers extended linearity and sensitivity, better than classical atomic absorption spectroscopy (AAS). Nevertheless, this sort of discharge is more expensive than either type of device (mainly due to the high argon consumption rate). Therefore, the geometry of the plasma torch arrangement must be studied very carefully in order to obtain an easy assembly and a low argon flow rate for the best analytical results possible.
Document Type: Short Communication
Affiliations: Laboratoire de Chimie Industrielle et Analytique, Institut National des Sciences Appliquées, Bat. 401, 20 Avenue A. Einstein, 69621 Villeurbanne Cedex, France
Publication date: May 1, 1977
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