The Interaction of Water Vapor with Erbium and Erbium Dideuteride Films

$29.00 plus tax (Refund Policy)

Buy Article:


In the processing of reactive metal films, which are used for hydrogen storage, considerable damage to the surfaces of these films occurs due to gaseous contaminants. One of the major contaminants encountered in the vacuum environment where these films are deposited and hydrided is water vapor.

Keywords: Erbium; Hydrogen storage; Rare earth; Rare earth hydride; Rare earth oxide; Water vapor

Document Type: Short Communication


Affiliations: Neutron Devices Department, General Electric Company, P.O. Box 11508, St. Petersburg, Florida 33733 and Department of Chemistry, University of South Florida, Tampa, Florida 33620

Publication date: March 1, 1977

More about this publication?
Related content



Share Content

Access Key

Free Content
Free content
New Content
New content
Open Access Content
Open access content
Subscribed Content
Subscribed content
Free Trial Content
Free trial content
Cookie Policy
Cookie Policy
ingentaconnect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more