The Interaction of Water Vapor with Erbium and Erbium Dideuteride Films

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Abstract:

In the processing of reactive metal films, which are used for hydrogen storage, considerable damage to the surfaces of these films occurs due to gaseous contaminants. One of the major contaminants encountered in the vacuum environment where these films are deposited and hydrided is water vapor.

Keywords: Erbium; Hydrogen storage; Rare earth; Rare earth hydride; Rare earth oxide; Water vapor

Document Type: Short Communication

DOI: http://dx.doi.org/10.1366/000370277774463940

Affiliations: Neutron Devices Department, General Electric Company, P.O. Box 11508, St. Petersburg, Florida 33733 and Department of Chemistry, University of South Florida, Tampa, Florida 33620

Publication date: March 1, 1977

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