Emission Spectrometric Arcing Procedure with Minimal Effect of Chemical Form of Sample

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This paper describes a study of matrix effects related to the chemical form of materials analyzed. The study was made using an arc in argon buffered with silver chloride. The effect of chemical form was minimal for a variety of metals, oxides, and carbides representing the most refractory compounds and thermally stable metal-containing molecules. Among these, only four of the most refractory materials known showed significant emission depressions due to incomplete volatilization in the arc system. These results are discussed in terms of vapor pressure of the solid materials placed on the anodes and dissociation reactions of the molecules in the gaseous environment.

Keywords: Chemical interference effects; Direct current arc; Emission spectroscopy; Methods, analytical

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/000370276774457155

Affiliations: National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135

Publication date: May 1, 1976

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