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The Determination of HF, HCI, SiF4, and HCF3 in WF6 Gas

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Abstract:

An infrared absorption method in the 1- to 15-μ range has been developed for determining HF, HCl, HCF3, and SiF4 in WF6 gas. Because of the reactivity and corrosiveness of WF6, a special gas absorption cell and gas-sampling apparatus were designed and built. Calibration curves were generated for a 10-cm cell. Sensitivity values were 100 wppm for HF and HCl, and 10 wppm for HCF3 and SiF4.

Keywords: Infrared; WF6 analysis

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/000370274774332786

Affiliations: General Atomic Company, P. O. Box 81608, San Diego, California 92138

Publication date: March 1, 1974

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