Spectroscopic Investigations of Some Halide Reactions in Plasma-Generating Devices

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The behaviors of some halides of carbon (CF4, CCl4, CF3Cl, and Teflon), silicon (SiF4 and SiCl4), and boron (BF3) in plasma reactors have been investigated by emission spectroscopy. The emission spectra from these compounds have been identified and arise from excited diatomic molecules SiF, SiO, BO, C2, and CN and excited atoms of Si, B, and C. On the basis of the observed spectra and energetic and thermodynamic arguments, it is concluded that dissociation, excitation, and/or ionization processes requiring 25–30 eV are predominant in the plasma reactors under the experimental conditions of these studies.

Document Type: Research Article

DOI: http://dx.doi.org/10.1366/000370266774386326

Affiliations: 1: Rice University, Houston, Texas; presented at the Third National Meeting of the Society for Applied Spectroscopy, 28 September-4 October 1964, Cleveland, Ohio 2: Rice University, Houston, Texas 3: Rice University, Houston, Texas; Formerly with the Department of Chemistry, University of Wisconsin, Madison, Wisconsin

Publication date: January 1, 1966

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