Five cases of photocontact dermatitis due to topical ketoprofen:photopatch testing and cross-reaction study

Authors: Matsushita T.; Kamide R.

Source: Photodermatology Photoimmunology & Photomedicine, Volume 17, Number 1, February 2001 , pp. 26-31(6)

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Abstract:

Background:

In parallel with the popular usage of topical ketoprofen, the number of reported cases of ketoprofen-induced photoallergic contact dermatitis has been increasing. It is clinically important to know the cross-reactivity of ketoprofen in order to avoid cross-sensitization caused by several structurally similar non-steroidal anti-inflammatory drugs (NSAID) on the market.

Methods:

To evaluate the spectrum of cross sensitization, photopatch testing was performed on five patients with ketoprofen-induced photoallergic contact dermatitis using ketoprofen and other structurally similar chemicals, such as oxybenzone, tiaprofenic acid and suprofen.

Results:

All five patients reacted positively to ketoprofen or ketoprofen plaster on photopatch testing. All four patients photopatch tested with related chemicals showed cross-photosensitization with tiaprofenic acid and suprofen. However, none of the patients reacted positively to oxybenzone.

Conclusion:

Either the diphenylketone moiety or a structurally similar tiophene-phenylketone moiety is important as the antigenic determinants of ketoprofen photoallergy. The arylpropionic acid side chain would not be involved.

Keywords: photoallergic contact dermatitis; ketoprofen; oxybenzone; tiaprofenic acid; suprofen; cross-reaction

Language: English

Document Type: Original article

DOI: http://dx.doi.org/10.1034/j.1600-0781.2001.017001026.x

Affiliations: Department of Dermatology, The Jikei University School of Medicine, Tokyo, Japan

Publication date: 2001-02-01