Effect of nitrogen content on nanostructure and mechanical properties of TiC_xN_y thin films

Authors: J. P. Wang, Y. H. Lu, Y. G. Shen

Source: Surface Engineering

Publisher: Maney Publishing

Abstract:

A series of TiC_xN_y thin films were deposited at 500°C on Si (100) substrates by way of incorporation of different amounts of nitrogen into TiC_0.45 using reactive unbalanced dc magnetron sputtering method. Their phase configurations, microstructures and mechanical behaviours were subsequently investigated by X-ray diffraction, X-ray photoelectron spectroscopy and microindentation methods. The result indicated that TiC_0.45 showed a fcc-like B-NaCl polycrystallite, and a solid solution nanocrystalline (nc-) TiC_xN_y with the same structure was formed by way of dissolution of nitrogen into TiC_0.45 lattice when the atomic ratio of (C+N)/Ti was less than one unit. Both hardness and residual compressive stress values were increased with increasing N content. Their maximums were believed to be obtained at nc-Ti(C,N) solid solution with an atomic ratio of one unit. Enhancement of both of them was attributed to solid solution.

Document Type:

DOI: 10.1179/026708410X12459349720178

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