Influence of CH₃SO₃H and AlCl₃ in direct and pulse current electrodeposition of trivalent chromium

Authors: Mohan, S.¹; Vijayakumar, J.²; Saravanan, G.²

Source: Surface Engineering, Volume 25, Number 8, November 2009 , pp. 570-576(7)

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Abstract:

Comparison of direct and pulse current electrodeposition of the trivalent chromium from urea formic acid as a complexing agent was studied in detail. The influences of CH₃SO₃H and AlCl₃ on the properties of the deposit were also studied. The presence of CH₃SO₃H exhibits higher current efficiency and better corrosion resistance because of its higher hydrogen overpotential. The pulse current electrodeposition leads to growth of β-Cr. The corrosion studies were conducted by potentiodynamic polarisation and electrochemical impedance spectroscopy. The morphology of the deposits was characterised by scanning electron microscopy (SEM) and X-ray diffraction.

Keywords: OFF TIME; PULSE ELECTRODEPOSITION; CHROMIUM; COATINGS; ON TIME

Document Type: Research Article

DOI: http://dx.doi.org/10.1179/026708409X364957

Affiliations: 1: Central electrochemical research institute, Karaikudi 630006, India;, Email: sanjnamoahn@yahoo.com 2: Central electrochemical research institute, Karaikudi 630006, India

Publication date: 2009-11-01

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