Author: Jawid Askari, S.

Source: Surface Engineering, Volume 25, Number 6, August 2009 , pp. 482-486(5)

Publisher: Maney Publishing

Abstract:

Nanocrystalline diamond (NCD) films on titanium alloys are of importance for tribology and biomedical implants. However, due to the different thermal expansion coefficients of the two materials, the complex nature of the interlayer formed during diamond deposition, and the difficulty in achieving very high nucleation density, it is difficult to deposit adherent thin NCD films on titanium and its alloys. In the present study smooth NCD films were successfully deposited in microwave chemical vapour deposition plasma from CH₄/H₂ mixtures, for the purpose of improving the film's adhesion and the wear resistance of the titanium. An exceptional adhesion of NCD film to the titanium substrate was observed by indentation testing up to 150 kg load. The friction coefficient against a cemented carbide ball of 10 mm in diameter with 20 N load was estimated to be ?0·05 in dry air. Detailed experimental results of the preparation, characterisation and successful deposition of the NCD film on pure Ti are discussed.

Keywords: ADHESION; CHEMICAL VAPOUR DEPOSITION; LOW FRICTION; NANOCRYSTALLINE DIAMOND FILMS; TITANIUM SUBSTRATE

Document Type: Research Article

DOI: http://dx.doi.org/10.1179/026708408X334159

Affiliations: Institute of Manufacturing Engineering, PNEC, National University of Sciences and Technology (NUST), Karachi 75350, Pakistan; Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China

Publication date: 2009-08-01

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