Surface morphology and properties of zirconia thin films prepared at different deposition rates

Authors: Zhang, D. P.; Qi, H. J.; Shao, S. Y.; He, H. B.; Shao, J. D.; Fan, Z. X.

Source: Surface Engineering, Volume 22, Number 2, April 2006 , pp. 157-160(4)

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Abstract:

ZrO₂ thin films were prepared on BK7 glass substrates by electron beam evaporation deposition method. The influence of deposition rate varying from 1·2 to 6·3 nm s^?1 on surface morphology and other properties of ZrO₂ films were examined. With increasing deposition rate, the surface defect density increased. The decrease in half width at full maximum in X-ray diffraction pattern with deposition rate indicates an increase in crystal dimension with increasing deposition rate. Electron beam deposited ZrO₂ films are known to be inhomogeneous. From the change of the peak transmittance value, it can be deduced that the inhomogeneity of ZrO₂ films strengthened gradually with increasing deposition rate. The type of surface defects changed from nodules to craters when the deposition rate was high enough.

Keywords: DEPOSITION RATE; XRD; INHOMOGENEITY; ZRO2 FILMS

Document Type: Research Article

DOI: http://dx.doi.org/10.1179/174329406X98476

Publication date: 2006-04-01

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