Virtual substrate model for in situ thin film thickness determination
Authors: Navarro, M.; Fandiño, J.
Source: Surface Engineering, Volume 16, Number 1, February 2000 , pp. 70-72(3)
Publisher: Maney Publishing
Abstract:A computational system has been developed for in situ monitoring of the optical properties of transparent thin films, grown by the spray pyrolysis technique on specular semi-infinite substrates, using the virtual substrate model for normal incidence reflectance. The system consists of a PC, a custom made data acquisition board, and software capable of in situ thickness monitoring and post-deposition analysis of optical parameters using the R = R(t) curve. The Levenberg– Marquardt numerical procedure was used in order to fit theoretical and experimental values of the normal incidence reflectance data with a small percentage error.
Document Type: Regular Paper
Affiliations: The Laboratorio de Celdas Solares, IMRE, Universidad de La Habana, Zapata s/n, La Habana, CP 10400, Cuba
Publication date: February 2000
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