Authors: Zhang, S.¹; Xie, H.¹; Hing, P.²; Mo, Z.³

Source: Surface Engineering, Volume 15, Number 4, August 1999 , pp. 341-346(6)

Publisher: Maney Publishing

Abstract:

Amorphous carbon coatings up to 2 ?m thick were deposited on WC–Co substrates by magnetron sputter ing of a graphite target in Ar and Ar–H_t2 atmospheres. The Raman peak intensity ratio of the D band to the G band I_d /I_g and the G band peak shift decreased initially but subsequently increased with bias power. Chamber pressure directly influenced the adhesion and hardness of the coating. It was established that below a certain minimum chamber pressure, there was spontaneous coating detachment. X-ray photoelectron spectroscopy depth profiling was used to quantify the cobalt depletion at the substrate surface as a function of sputter cleaning bias power. It was found that scratch adhesion strength increased with sputter clean ing power and reached a maximum at about 200 W, or -210 V in terms of induced voltage. The increase in adhesion strength was attributed to better cleaning of the interface cobalt.

Document Type: Regular Paper

DOI: http://dx.doi.org/10.1179/026708499101516623

Affiliations: 1: The Gintic Institute of Manufacturing Technology, 71 Nanyang Drive, Singapore, 638705, Singapore 2: The School of Applied Science, Nanyang Technological University, Nanyang Avenue, Singapore, 639798, Singapore 3: The Singapore Productivity and Standard Board, 1 Science Park Drive, Singapore, 118221, Singapore

Publication date: 1999-08-01

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