Towards ultrahigh resolution EBSD by low accelerating voltage

Authors: Steinmetz, D. R.1; Zaefferer, S.2

Source: Materials Science and Technology, Volume 26, Number 6, June 2010 , pp. 640-645(6)

Publisher: Maney Publishing

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Abstract:

By using a low SEM accelerating voltage in the range of 5–7·5 kV with an electron backscatter diffraction system, the interaction volume of electrons with matter is markedly decreased, and the spatial resolution is improved. The authors present measurements which prove this relationship. Electron backscatter diffraction at low acceleration voltage, however, is not a straightforward technique with the current equipment and a standard set-up. The authors show that an optimised working distance and dedicated sample preparation are essential to obtain improved spatial resolution for detailed nanoscale microstructure investigations.

Keywords: TWIP STEEL; RESOLUTION; ELECTRON BACKSCATTER DIFFRACTION; LOW VOLTAGE

Document Type: Research Article

DOI: http://dx.doi.org/10.1179/026708309X12506933873828

Affiliations: 1: Max-Planck-Institut für Eisenforschung, Max-Planck-Straße 1, 40237 Düsseldorf, Germany;, Email: d.steinmetz@mpie.de 2: Max-Planck-Institut für Eisenforschung, Max-Planck-Straße 1, 40237 Düsseldorf, Germany

Publication date: 2010-06-01

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