Towards ultrahigh resolution EBSD by low accelerating voltage
Authors: Steinmetz, D. R.1; Zaefferer, S.2
Source: Materials Science and Technology, Volume 26, Number 6, June 2010 , pp. 640-645(6)
Publisher: Maney Publishing
Abstract:
By using a low SEM accelerating voltage in the range of 5–7·5 kV with an electron backscatter diffraction system, the interaction volume of electrons with matter is markedly decreased, and the spatial resolution is improved. The authors present measurements which prove this relationship. Electron backscatter diffraction at low acceleration voltage, however, is not a straightforward technique with the current equipment and a standard set-up. The authors show that an optimised working distance and dedicated sample preparation are essential to obtain improved spatial resolution for detailed nanoscale microstructure investigations.Keywords: TWIP STEEL; RESOLUTION; ELECTRON BACKSCATTER DIFFRACTION; LOW VOLTAGE
Document Type: Research Article
DOI: http://dx.doi.org/10.1179/026708309X12506933873828
Affiliations: 1: Max-Planck-Institut für Eisenforschung, Max-Planck-Straße 1, 40237 Düsseldorf, Germany;, Email: d.steinmetz@mpie.de 2: Max-Planck-Institut für Eisenforschung, Max-Planck-Straße 1, 40237 Düsseldorf, Germany
Publication date: 2010-06-01
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Materials Science and Technology is the successor of two previous titles, for which digitised archives are available: Metal Science (Vols. 1—17; 1967—84) and Metals Technology (Vols. 1—11; 1974—84).
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