Home >> Materials Science and Technology, Volume 11, Number 1
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Publisher: Maney Publishing on behalf of Institute of Materials, Minerals and Mining

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Volume 11, Number 1, January 1995
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Editorial

Free Content Materials for Microelectronics
pp. 1-1(1)
Authors: Willoughby, A. F. W.; Morante, J. R.

Keynote paper

Exploration of entire range of III-V semiconductors and their device applications
pp. 3-30(28)
Authors: Razeghi, M.; Choi, Y. H.; He, X.; Sun, C. J.

Articles

Selective low pressure chemical vapour deposition epitaxy using silane only for advanced device applications
pp. 31-35(5)
Authors: Bonar, J. M.; Parker, G. J.

Low stress nitride as surface isolation in bipolar transistors
pp. 36-40(5)
Authors: Nanver, L. K.; French, P. J.; Goudena, E. J. G.; van Zeijl, H. W.

Influence of CH4/H2 reactive ion etching on electrical and optical properties of AlGaAs/GaAs and pseudomorphic AlGaAs/InGaAs/GaAs heterostructures
pp. 41-45(5)
Authors: van Es, C. M.; Eijkemans, T. J.; Wolter, J. H.; Pereira, R.; Van Have, M.; Van Rossum, M.

Laser patterning of superconducting YBa2Cu3O7-x thin films
pp. 46-49(4)
Authors: Aguiar, R.; Sánchez, F.; Morenza, J.L.; Varela, M.

X-ray characterisation of InGaAs/AlAs multiple quantum well p-i-n structures
pp. 50-53(4)
Authors: Hart, L.; Ghisoni, M.; Stavrinou, P.; Roberts, C.; Parry, G.

Assessment of semiconductor epitaxial growth by transmission electron microscopy
pp. 54-65(12)
Authors: Brown, P. D.; Humphreys, C. J.

Localised strain characterisation in semiconductor structures using electron diffraction contrast imaging
pp. 66-71(6)
Authors: Janssens, K. G. F.; Van der Biest, O.; Vanheliemont, J.; Maes, H. E.; Hull, R.; Bean, J. C.

Characterisation of semiconductor structures by high resolution X-ray diffraction
pp. 72-79(8)
Authors: Sanz-Hervás, A.; Abril, E. J.; Paz, D. I.; de Benito, G.; Llorente, C.; Aguilar, M.; López, M.

Characterisation of semi-insulating polysilicon oxygen doped silicon thin films
pp. 80-84(5)
Authors: Lynch, S.; Greef, R.; Stoemenos, J.; Dartnell, N. J.; Lloyd, N. S.; Kern, P.; Stuck, R.; Crean, G. M.

Nanomodification of silicon (100) surface with scanning tunnelling microscopy using polysilicon on silicon structure
pp. 85-89(5)
Authors: Pérez-Murano, F.; Barniol, N.; Abadal, G.; Ye, J. H.; Aymerich, X.; Cané, C.

Simulation and in situ monitoring of metallic contamination and surface roughening in wet wafer cleaning solutions
pp. 90-93(4)
Authors: Norga, G. J.; Black, K. A.; M'saad, H.; Michel, J.; Kimerling, L. C.

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