Surface morphology study on effect of deposition temperature on nanostructured zinc oxide by chemical vapour deposition method
Authors: Khusaimi, Z.1; Ghani, N.A.2; Noor, F.W.M.3; Amizam, S.3; Rafaie, H.A.3; Mamat, M.H.2; Sahdan, M.Z.2; Abdullah, N.4; Abdullah, S.3; Rusop, M.5
Source: Materials Research Innovations, Volume 13, Number 3, September 2009 , pp. 196-198(3)
Publisher: Maney Publishing
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Abstract:
Nanocrystalline ZnO was grown on Si and porous Si substrates, by chemical vapour deposition without metal catalyst. Increasing deposition temperature from 400 to 450°C at 0·5 L min-1 Ar flow rate, exhibited an improvement in the spread of ZnO, and smaller clusters of ZnO. At the same temperature range in Ar flow rate of 0·4 L min-1, ZnO nanoflower was formed.Keywords: ZINC OXIDE; NANOCRYSTALLINE; SILICON; POROUS SILICON; CHEMICAL VAPOUR DEPOSITION METHOD
Document Type: Research article
DOI: 10.1179/143307509X437608
Affiliations: 1: Nano-SciTech Centre, Institute of Science, Universiti Teknologi MARA (UiTM), 40450, Shah Alam, Selangor, Malaysia;, Email: zurai142@salam.uitm.edu.my 2: Solar Cell Laboratory, Faculty of Electrical Engineering, Universiti Teknologi MARA (UiTM), 40450 Shah Alam, Selangor, Malaysia 3: Nano-SciTech Centre, Institute of Science, Universiti Teknologi MARA (UiTM), 40450, Shah Alam, Selangor, Malaysia 4: Faculty of Science, University Malaya, Kuala Lumpur, Malaysia 5: Nano-SciTech Centre, Institute of Science, Solar Cell Laboratory, Faculty of Electrical Engineering, Universiti Teknologi MARA (UiTM), 40450 Shah Alam, Selangor, Malaysia
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