Authors: Flores, J. F.; Olaya, J. J.; Colás, R.; Rodil, S. E.; Valdez, B. S.; Fuente, I. G.

Source: Corrosion Engineering, Science and Technology, Volume 41, Number 2, June 2006 , pp. 168-176(9)

Publisher: Maney Publishing

Abstract:

The corrosion behaviour of tantalum nitride (TaN) thin films deposited on AISI 1018 carbon steel, AISI M2 tool steel and AISI 304 stainless steel has been investigated in an aqueous sodium chloride solution. The films were produced by means of magnetron sputtering plasma deposition. Morphological and microstructuctural characteristics of the films were studied by atomic force microscopy and X-ray diffraction analysis. Potentiodynamic polarisation, electrochemical impedance spectroscopy and cyclic voltammetry techniques were used for electrochemical characterisation. The TaN films displayed lower corrosion current densities than those of the substrates. A relaxation time in the impedance analysis was observed in the 1018/TaN system, two relaxation times were observed in the M2/TaN system, and a diffusion process was found in the 304/TaN system. This indicates that the substrates were not completely isolated from the solution and the defects in the films appear to be detrimental owing to electrolyte penetration through the defects which caused localised corrosion. The corrosion behaviour of the films depends mainly on the electrochemical properties of the substrate.

Keywords: POTENTIODYNAMIC POLARISATION; TANTALUM NITRIDE; MAGNETRON SPUTTERING; SURFACE ANALYSIS; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; CORROSION

Document Type: Research Article

DOI: http://dx.doi.org/10.1179/174327806X107941

Publication date: 2006-06-01

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