Spontaneous formation of large-area monolayers of well-ordered nanoparticles via a wet-coating process

Authors: Minghui Hu¹; Shigeki Chujo²; Hiroyuki Nishikawa¹; Yukio Yamaguchi¹; Tatsuya Okubo³

Source: Journal of Nanoparticle Research, Volume 6, Number 5, October 2004 , pp. 479-487(9)

Publisher: Springer

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Abstract:

Monolayers of well-ordered close-packed silica nanoparticles (NPs) with a diameter of 25 nm were spontaneously formed on silicon substrates over a large area and at a high rate via a wet-coating process using a capillary coater. The effects of zeta potential, dispersion solvent, and substrate friction on the NP self-assembly induced by the solvent evaporation were investigated. Experimental results showed that the solvent and the substrate had a larger impact on the order of formed monolayers than the zeta potential did, which are discussed from the viewpoint of the Derjaguin-Landau-Verwey-Overbeek (DLVO) and non-DLVO theories. Based on the above studies, we proposed a solution to fabrication of well-ordered NP monolayers without boundary defects at the surface coverage of sim

1 via the wet-coating process.

Keywords: silica; nanoparticles; monolayer; capillary coater; self-assembly; zeta potential; DLVO forces; non-DLVO forces; colloids; coatings

Document Type: Research article

DOI: http://dx.doi.org/10.1007/s11051-004-2163-8

Affiliations: 1: Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan, 2: Japan Chemical Innovation Institute, 1-3-5 Kandajinbocho, Chiyoda-ku, Tokyo, 101-0051, Japan, 3: Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan, Email: okubo@chemsys.t.u-tokyo.ac.jp

Publication date: 2004-10-01