In situ AFM, XRD and Resistivity Studies of the Agglomeration of Sputtered Silver Nanolayers
Source: Journal of Nanoparticle Research, Volume 3, Number 4, August 2001 , pp. 271-278(8)
In situ atomic force microscopy (AFM), X-ray diffraction (XRD) and resistivity studies have been made for RF cathode-sputtered silver nanolayers on different oxide surfaces during heating between room temperature and 400°C. Our earlier AFM and resistivity measurements revealed the agglomeration of layers during heating. The present in situ AFM, XRD and resistivity measurements show a sudden rapid agglomeration of the sputtered ultra-thin silver nanolayers during heating at specific temperatures, which depend on the layer thickness. When the AFM picturing was initiated from a layer surface at a temperature slightly below the specific agglomeration temperature of the layer, the AFM tip excited the surface starting the agglomeration in the area under picturing. This tip-assisted agglomeration phenomenon made it possible to restrict the area of agglomeration and to produce sub-micron structures in the silver nanolayer by AFM.
Document Type: Regular paper
Affiliations: 1: Department of Electron Devices, Technical University of Budapest, 1521 Budapest. Goldmann Gy. ter 3., Hungary (Tel.: +1-463-2702; Fax: +1-463-2973; E-mail: email@example.com) 2: Microelectronics and Materials Physics Laboratories, University of Oulu, Linnanmaa, 90570 Oulu, Finland (E-mail: firstname.lastname@example.org)
Publication date: 2001-08-01