Metalorganic Chemical Vapor Deposition Growth and Characterization of InGaP/GaAs Superlattices

Authors: Zhang, X.B.; Ryou, J.H.; Dupuis, R.D.; Walter, G.; Holonyak, N.

Source: Journal of Electronic Materials, Volume 35, Number 4, April 2006 , pp. 705-710(6)

Publisher: Springer

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Abstract:

Lattice-matched In_0.49Ga_0.51P/GaAs superlattices were grown on (001) GaAs substrates using metalorganic chemical vapor deposition. The interface properties were characterized by photoluminescence, transmission electron microscopy, and x-ray diffraction. By varying the growth temperature, the precursor flow rates, and the growth interruption at the interfaces, we found that, while arsenic and phosphorus carry over have some effect on the formation of a low-bandgap InGaAsP quaternary layer at the interfaces, the In surface segregation seems to play an important role in the formation of the interface quaternary layer. Evidence of this indium segregation comes from x-ray and photoluminescence studies of samples grown at different temperatures. These studies show that the formation of an interfacial layer is more prominent when the growth temperature is higher. Growing a thin (∼1 monolayer thick) GaP intentional interfacial layer on top of the InGaP before the growth of the GaAs layer at the P→As transition effectively suppresses the formation of the low-bandgap unintentional interface layer. On the other hand, the growth of a thin GaAsP (or GaP) layer before the growth of the InGaP layer, at the As→P transition increases the formation of a low-bandgap interfacial layer. This nonequivalent effect of a GaP layer at the two interfaces on the PL properties is discussed.

Keywords: INGAP; INTERFACE; METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD)

Document Type: Research article

Publication date: 2006-04-01