Optical Emission Characteristics of Ablation Plasma Plumes during the Laser-Etching Process of CdTe
Authors: Abe, K.; Eryu, O.; Nakashima, S.; Terai, M.; Kubo, M.; Niraula, M.; Yasuda, K.
Source: Journal of Electronic Materials, Volume 34, Number 11, November 2005 , pp. 1428-1431(4)
Abstract:Optical emission and surface compositional change during the laser-etching process of CdTe are reported. The etching rate increases in proportion to the laser energy density. However, the increase in etching rate is suppressed because ablation plasma plumes generated by the laser irradiation at the energy densities above 0.4 J/cm2 shield the laser beam. The etching rate at the energy density of 1.0 J/cm2 has been determined to be 91 nm/pulse. Also, 80-μm-deep and 55-μm-wide trenches have been formed with the laser-etching process.
Document Type: Regular paper
Publication date: 2005-11-01