Numerical Simulation of Thermal Wave Propagation during Laser Processing of Thin Films
Authors: Ai, X.; Li, B.Q.
Source: Journal of Electronic Materials, Volume 34, Number 5, May 2005 , pp. 583-591(9)
Abstract:A numerical model is developed to represent the thermal wave propagation during ultrashort pulsed laser processing of thin films. The model developed is based on the solution of non-Fourier heat conduction problem with temperature and thermal flux delays using discontinuous finite-element method. The mathematical formulation is described and computational procedures are given. The computer model is validated using the analytical solution for one-dimensional (1-D) thermal wave equations. Numerical simulations are performed to study the thermal wave propagation in a GaAs thin film exposed to ultrashort laser pulses. A wavelike behavior of the thermal signal propagation is observed, and the diffusive effect of the time relaxation in the temperature gradient is calculated and discussed. The thermal behavior of thin films under laser radiation is also studied as a function of various process parameters including pulse duration, laser pulse shapes and characteristic times of heat fluxes.
Document Type: Research Article
Publication date: May 1, 2005