Investigation of Longitudinal-Optical Phonon-Plasmon Coupled Modes in SiC Epitaxial Film Using Fourier Transform Infrared Reflection
Authors: Sunkari, Swapna; Mazzola, M.S.; Mazzola, J.P.; Das, Hrishikesh; Wyatt, J.L.
Source: Journal of Electronic Materials, Volume 34, Number 4, April 2005 , pp. 320-323(4)
Publisher: Springer
Abstract:
Room-temperature Fourier transform infrared reflection (FTIR) spectroscopy was carried out on heavily and lightly doped 4H-SiC films grown by chemical vapor deposition on conducting, n-type (nitrogen) doped substrates. A modelbased curve fit of the experimentally observed reflectance spectra from these samples is performed using a dielectric function that accounts for the phononphoton coupling and plasmon-photon coupling. The value of the longitudinaloptical (LO) phonon frequency estimated from the reflectance spectrum in the range 600-1,200 cm−1 is observed to increase in direct correlation with the electron free-carrier concentration (FCC). This shift reflects phonon-plasmon coupled modes. The shift from the undisturbed ωLO observed, for example, in semi-insulating SiC is exploited to improve the model-based estimation of epi parameters such as thickness and doping in cases where the free-carrier concentration is less than about 2 × 1018 cm−3Keywords: 4H-SIC; FOURIER TRANSFORM INFRARED REFLECTION (FTIR); LONGITUDINAL-OPTICAL (LO) PHONON-PLASMON COUPLED M; FREE-CARRIER CONCENTRATION (FCC)
Document Type: Research article
Publication date: 2005-04-01
- In this: publication
- By this: publisher
- In this Subject: Materials & Manufacturing
- By this author: Sunkari, Swapna ; Mazzola, M.S. ; Mazzola, J.P. ; Das, Hrishikesh ; Wyatt, J.L.

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