Reprocessing of Thermally Oxidized Aluminum Arsenide (AlAs) in Epitaxial Multilayers without Delamination
Authors: Hobbs, L.; Eddie, I.; Erwin, G.; Bryce, A.C.; de la Rue, R.M.; Roberts, J.S.; Krauss, T.F.; Mccomb, D.W.; Mackenzie, M.
Source: Journal of Electronic Materials, Volume 34, Number 3, March 2005 , pp. 232-239(8)
Abstract:Annealing or processing of AlAs that has been subjected to a wet thermal oxidation process can result in severe delamination of material at the oxidation front. This paper reports a procedure for preventing this delamination and presents a possible cause for the delamination.
Document Type: Regular Paper
Publication date: March 1, 2005