HgCdTe Focal Plane Arrays for Dual-Color Mid- and Long-Wavelength Infrared Detection
Authors: Smith, E.P.G.; Pham, L.T.; Venzor, G.M.; Norton, E.M.; Newton, M.D.; Goetz, P.M.; Randall, V.K.; Gallagher, A.M.; Pierce, G.K.; Patten, E.A.; Coussa, R.A.; Kosai, K.; Radford, W.A.; Giegerich, L.M.; Edwards, J.M.; Johnson, S.M.; Baur, S.T.; Roth, J.A.; Nosho, B.; De Lyon, T.J.; Jensen, J.E.; Longshore, R.E.
Source: Journal of Electronic Materials, Volume 33, Number 6, 1 June 2004 , pp. 509-516(8)
Publisher: Springer
Abstract:
Raytheon Vision Systems (RVS, Goleta, CA) in collaboration with HRL Laboratories (Malibu, CA) is contributing to the maturation and manufacturing readiness of third-generation, dual-color, HgCdTe infrared staring focal plane arrays (FPAs). This paper will highlight data from the routine growth and fabrication of 256 × 256 30- μm unit-cell staring FPAs that provide dual-color detection in the mid-wavelength infrared (MWIR) and long wavelength infrared (LWIR) spectral regions. The FPAs configured for MWIR/MWIR, MWIR/LWIR, and LWIR/LWIR detection are used for target identification, signature recognition, and clutter rejection in a wide variety of space and ground-based applications. Optimized triple-layer heterojunction (TLHJ) device designs and molecular beam epitaxy (MBE) growth using in-situ controls has contributed to individual bands in all dual-color FPA configurations exhibiting high operability (>99%) and both performance and FPA functionality comparable to state-of-the-art, single-color technology. The measured spectral cross talk from out-of-band radiation for either band is also typically less than 10%. An FPA architecture based on a single-mesa, single-indium bump, and sequential-mode operation leverages current single-color processes in production while also providing compatibility with existing second-generation technologies.Keywords: DUAL-COLOR; FOCAL PLANE ARRAY (FPA); MID-WAVELENGTH INFRARED (MWIR); LONG-WAVELENGTH INFRARED (LWIR); MOLECULAR BEAM EPITAXY (MBE)
Document Type: Research article
Publication date: 2004-06-01
- In this: publication
- By this: publisher
- In this Subject: Materials & Manufacturing
- By this author: Smith, E.P.G. ; Pham, L.T. ; Venzor, G.M. ; Norton, E.M. ; Newton, M.D. ; Goetz, P.M. ; Randall, V.K. ; Gallagher, A.M. ; Pierce, G.K. ; Patten, E.A. ; Coussa, R.A. ; Kosai, K. ; Radford, W.A. ; Giegerich, L.M. ; Edwards, J.M. ; Johnson, S.M. ; Baur, S.T. ; Roth, J.A. ; Nosho, B. ; De Lyon, T.J. ; Jensen, J.E. ; Longshore, R.E.

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