Synthesis and characterization of porous polymeric low dielectric constant films

Authors: Xu, Yuhuan; Zheng, D.; Tsai, Yipin; Tu, K.; Zhao, Bin; Liu, Q.; Brongo, Maureen; Ong, Chung; Choy, Chung; Sheng, George; Tung, C.

Source: Journal of Electronic Materials, Volume 30, Number 4, April 2001 , pp. 309-313(5)

Publisher: Springer

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Abstract:

This paper reports the synthesis and dielectric properties of a porous poly(arylether) material with an ultra-low dielectric constant for interlayer dielectric applications in microelectronics. The porous polymer films were successfully fabricated by a method of organic phase separation and evaporation. A dielectric constant k of 1.8 was achieved for a porous film with an estimated porosity of 40% and average pore size of 3 nm. Electrical and mechanical properties as well as coefficient of thermal expansion for both dense and porous polymer films were measured.

Keywords: Ultra-low dielectric constant; poly(arylene) ethers; porous polymer film

Document Type: Research article

DOI: http://dx.doi.org/10.1007/s11664-001-0036-9

Publication date: 2001-04-01